You can manage flow both into and out of a process with new MCD-Series dual-valve mass flow controllers.
Designs handle mass flow rate, volumetric flow rate, and absolute pressure of gases in two flow directions via dual-valve design. MCD accommodates demanding process control requirements in gas analysis, leak testing, or environmental applications.
Its dedicated inlet valve and dedicated exhaust valve help control upstream and downstream flows as well as positive pressure or backpressure - in both open and closed systems. This is especially useful in processes that require bidirectional flow control and/or pressure control as well as for pressure control in closed systems.
MCD features patented internally compensated laminar differential pressure measurement.